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标 题: 【代友发帖】招兼职英译汉专利翻译,长期有活
发信站: 水木社区 (Thu May 17 20:18:14 2007), 站内
【代友发帖】招兼职英译汉专利翻译,长期有活
要求:
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Part.I
METHOD FOR FABRICATING 1T-DRAM ON BULK SILICON
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the benefit of U.S. Provisional
Application No. 60/782,479, filed on March 15, 2006. The disclosure of the
above application is incorporated herein by reference in its entirety.
FIELD
[0002] The present disclosure relates to memory arrays and, more
particularly, to memory arrays fabricated on bulk silicon.
Part.II
1. An integrated circuit comprising:
a bulk technology integrated circuit (bulk IC) including a bulk silicon
layer and complementary MOSFET (CMOS) transistors fabricated thereon; and
a first single transistor dynamic random access memory (1T
DRAM) cell arranged adjacent to and integrated with said bulk IC.
2. The integrated circuit of claim 1 wherein said first 1T DRAM cell
includes:
an amorphous silicon layer; and
first and second gates including first and second gate oxide layers
arranged adjacent to said amorphous silicon layer and first and second gate
polysilicon layers arranged in said first and second gate oxide layers.
Part.III
ABSTRACT OF THE DISCLOSURE
An integrated circuit includes a bulk technology integrated circuit (bulk IC)
including a bulk silicon layer and complementary MOSFET (CMOS) transistors
fabricated thereon. The integrated circuit also includes a single transistor
dynamic random access memory (1T DRAM) cell arranged adjacent to and
integrated with the bulk IC.
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